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Chemical Engineering Principles of C V D Processes
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Chemical Engineering Principles of C V D Processes

Chemical vapour deposition (CVD) is a chemical process to produce films. This is the first way and common way to make Ti3SiC2 films. In a typical CVD process, the substrate is exposed to several volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit....

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Chemical vapour deposition (CVD) is a chemical process to produce films. This is the first way and common way to make Ti3SiC2 films. In a typical CVD process, the substrate is exposed to several volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit....

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