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Dr. R. Nagarajan
http://www.che.iitm.ac.in/~nag/?page_id=65
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Chemical Engineering Principles of C V D Processes
by Dr. R. Nagarajan
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Particle Characterization
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Chemical Engineering Principles of C V D Processes
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Chemical Engineering Principles of C V D Processes
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Chemical Engineering Principles of C V D..
Chemical vapour deposition (CVD) is a chemical process to produce films. This is the first way and common way to make Ti3SiC2 films. In a typical CVD process, the substrate is exposed to several volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit.
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Chemical Engineering Principles of CVD Processes
Particle Characterization
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Published onLast Updated onUn-Published on
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Particle Characterization
This advanced course in “Particle Characterization” deals with methods and techniques for quantitatively and qualitatively evaluating properties of single particles and particulate assemblies. Emphasis is on the fine-particle size range, from micrometers to nanometer. Particle characteristics are linked to relevant applications in industry. Transport properties, adhesion/ cohesion phenomena and surface-particle removal mechanisms are dealt with in detail.
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particle characterization
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Dr. R. Nagarajan
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Ph.D., M.S., B.Tech., Chemical Engineering, Indian Institute of Technology, Madras.
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Ph.D., M.S., B.Tech., Chemical Engineering, Indian Institute of Technology, Madras. See More