Introduction to Microelectronic Fabricat..

Usually in microelectronics fabrication the wafer-cleaning steps are performed before the high-temperature, layer deposition and/or lithography process steps. The intention of the cleaning is to remove particles and photo resistant residues, metallic impurities, and organic contamination.

NOC:Electrochemical impedance Spectroscopy

Electrochemical Impedance Spectroscopy (EIS) is a frequency domain measurement made by applying a sinusoidal perturbation, often a voltage, to a system. The impedance at a given frequency is related to processes occurring at timescales of the inverse frequency (e.g. f=10 Hz, t=0.1 s). Although many other electrochemical measurements focus on driving a system far from equilibrium with potential sweeps or steps, such as cyclic voltammetry or chronoamperometry , EIS uses small perturbations.